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An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining.
A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial
Excimer lasers typically operate at ultraviolet wavelengths with major applications including semiconductor photolithography and LASIK eye surgery. Commonly used excimer molecules include ArF (emission at 193 nm), KrCl (222 nm), KrF (248 nm), XeCl (308 nm), and XeF (351 nm).
The argon fluoride laser (ArF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research.
Excimer lasers are gas-based light systems that are usually filled with inert and halide gases (Kr, Ar, Xe, F and Cl) that are charged by an electric field. The higher the frequency, the greater the resolution of the image. KrF lasers are able to function at a frequency of 4 kHz . In addition to running at a higher frequency, excimer lasers are ...
The Nike laser at the United States Naval Research Laboratory in Washington, DC is a 56-beam, 4–5 kJ per pulse electron beam pumped krypton fluoride excimer laser which operates in the ultraviolet at 248 nm with pulsewidths of a few nanoseconds. Nike was completed in the late 1980s and is used for investigations into inertial confinement fusion.
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