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An excimer laser. An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining. Since the 1960s, excimer lasers have been widely used in high-resolution ...
Laser. A telescope in the Very Large Telescope system producing four orange laser guide stars. A laser is a device that emits light through a process of optical amplification based on the stimulated emission of electromagnetic radiation. The word laser is an anacronym that originated as an acronym for light amplification by stimulated emission ...
The commonly used deep ultraviolet excimer lasers in lithography systems are the krypton fluoride (KrF) laser at 248 nm wavelength and the argon fluoride laser (ArF) at 193 nm wavelength. The primary manufacturers of excimer laser light sources in the 1980s were Lambda Physik (now part of Coherent, Inc.) and Lumonics.
The argon fluoride laser (ArF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research.
Laser types with distinct laser lines are shown above the wavelength bar, while below are shown lasers that can emit in a wavelength range. The height of the lines and bars gives an indication of the maximal power/pulse energy commercially available, while the color codifies the type of laser material (see the figure description for details).
Unlike deep ultraviolet (DUV) lithography sources, based on excimer lasers, EUV plasma sources produce light across a broad range of wavelengths [125] roughly spanning a 2% FWHM bandwidth near 13.5 nm (13.36nm – 13.65nm at 50% power). EUV (10–121nm) is the band longer than X-Rays (0.1–10nm) and shorter than the hydrogen Lyman-alpha line.
A krypton fluoride laser (KrF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research.
A fiber Bragg grating (FBG) is a type of distributed Bragg reflector constructed in a short segment of optical fiber that reflects particular wavelengths of light and transmits all others. This is achieved by creating a periodic variation in the refractive index of the fiber core, which generates a wavelength-specific dielectric mirror.