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An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining.
Excimer lasers typically operate at ultraviolet wavelengths with major applications including semiconductor photolithography and LASIK eye surgery. Commonly used excimer molecules include ArF (emission at 193 nm), KrCl (222 nm), KrF (248 nm), XeCl (308 nm), and XeF (351 nm).
A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial
The argon fluoride laser (ArF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research.
The Nike laser at the United States Naval Research Laboratory in Washington, DC is a 56-beam, 4–5 kJ per pulse electron beam pumped krypton fluoride excimer laser which operates in the ultraviolet at 248 nm with pulsewidths of a few nanoseconds. Nike was completed in the late 1980s and is used for investigations into inertial confinement fusion.
Excimer laser: 157 nm (F 2), 193.3 nm (ArF), 248 nm (KrF), 308 nm (XeCl), 351 nm (XeF) Excimer recombination via electrical discharge Ultraviolet lithography for semiconductor manufacturing, laser surgery, LASIK, scientific research.