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Strong stimulated emission was observed as the laser's spectral line narrowed from a continuum of 15 nm to just 0.25 nm, and the intensity increased a thousand-fold. The laser's estimated output of 1 joule was high enough to evaporate part of the mirror coatings, which imprinted its mode pattern.
Excimer lasers typically operate at ultraviolet wavelengths with major applications including semiconductor photolithography and LASIK eye surgery. Commonly used excimer molecules include ArF (emission at 193 nm), KrCl (222 nm), KrF (248 nm), XeCl (308 nm), and XeF (351 nm).
Current state-of-the-art photolithography tools use deep ultraviolet (DUV) light from excimer lasers with wavelengths of 248 (KrF) and 193 (ArF) nm (the dominant lithography technology today is thus also called "excimer laser lithography"), which allow minimum feature sizes down to 50 nm.
There are several laser types used in medicine for ablation, including argon, carbon dioxide (CO 2), dye, erbium, excimer, Nd:YAG, and others. Laser ablation is used in a variety of medical specialties including ophthalmology, general surgery, neurosurgery, ENT, dentistry, oral and maxillofacial surgery, and veterinary.
A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial
- Double-slit experiment - Wikipediawikipedia.org
The argon fluoride laser (ArF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research.
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