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Definitive evidence of a xenon excimer laser action at 173 nm using a high pressure gas at 12 atmospheres, also pumped by an electron beam, was first presented in March 1973, by Mani Lal Bhaumik of Northrop Corporation, Los Angeles.
The incisions, made by 193 nm far-ultraviolet light radiation emitted by the excimer laser, produced corneal flattening ranging from 0.12 to 5.35 diopters. Both the depth of the corneal incisions and the degree of central corneal flattening correlated with the laser energy applied.
Excimer lasers are a special sort of gas laser powered by an electric discharge in which the lasing medium is an excimer, or more precisely an exciplex in existing designs.
The Nike laser at the United States Naval Research Laboratory in Washington, DC is a 56-beam, 4–5 kJ per pulse electron beam pumped krypton fluoride excimer laser which operates in the ultraviolet at 248 nm with pulsewidths of a few nanoseconds. Nike was completed in the late 1980s and is used for investigations into inertial confinement fusion.
Pulsed operation of lasers refers to any laser not classified as continuous wave, so that the optical power appears in pulses of some duration at some repetition rate. [1] This encompasses a wide range of technologies addressing a number of different motivations. Some lasers are pulsed simply because they cannot be run in continuous mode.
ArF (and KrF) excimer lasers are widely used in high-resolution photolithography machines, a critical technology for microelectronic chip manufacturing. Excimer laser lithography [2] [3] has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 7 nanometers in 2018.
Metal-vapor lasers are gas lasers that typically generate ultraviolet wavelengths. Helium - silver (HeAg) 224 nm, neon - copper (NeCu) 248 nm and helium - cadmium (HeCd) 325 nm are three examples.
The electra laser at NRL is a KrF laser that demonstrated over 90,000 shots in 10 hours. A krypton fluoride laser ( KrF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of ...
Current state-of-the-art photolithography tools use deep ultraviolet (DUV) light from excimer lasers with wavelengths of 248 (KrF) and 193 (ArF) nm (the dominant lithography technology today is thus also called " excimer laser lithography "), which allow minimum feature sizes down to 50 nm.
A TEA laser is a gas laser energized by a high voltage electrical discharge in a gas mixture generally at or above atmospheric pressure. The most common types are carbon dioxide lasers and excimer lasers, both used extensively in industry and research; less common are nitrogen lasers.